The mechanism of spongy electrodeposits formation on inert substrate at low over potentials
نویسندگان
چکیده
2,3~7o,e 2,3r/o,a bulk concentration diffusion coefficient Faraday constant exp (r?/~7o,c) -exp (-r?/r~o,~) exp (r//~7o,e) exp ( r~/~o,a) exchange current density current density limiting current density limiting current density under spherical diffusion control number of electrons number of nuclei (cm 2) radius of growing nucleus radius of critical nucleus radius of growing nucleus at which deposition becomes mixed controlled time induction time for spongy growth initiation molar volume surface energy thickness of diffusion layer slope of cathodic Tafel line slope of anodic Tafel line
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EFFECT OF SUBSTRATE TEXTURE AND DEPOSITION CURRENT DENSITY ON PROPERTIES OF NiNANOCRYSTALLINE ELECTRODEPOSITS
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